Patent · US Expired

Photodefinable dielectric layers comprising poly(aromatic diacetylenes)

US5589424A · kind A · utility

1Cited by
2References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 17, 1995
Grant dateDec 31, 1996
Priority date—
Expiry dateOct 17, 2015

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Applicants have discovered an improved photodefined dielectric materials comprising poly(aromatic diacetylenes). The preferred poly(aromatic diacetylenes) are copolymers of aromatic diacetylenes. Specific examples are 1) a copolymer of 4,4'-diethynyldiphenyl ether and m-diethynyl benzene and 2) a copolymer of 4,4'-diethynyldiphenyl ether and 4,4'-bis(3-ethynylphenoxy)-2,2',3,3',5,5',6,6'-octafluorobiphenyl. These copolymers can be photochemically crosslinked in patterns with exposure of 30 mJ/cm.sup.2 .mu.m and 60 mJ/cm.sup.2 .mu.m, respectively, and patterns have been produced in 10 .mu.m thick films with features as small as 12 .mu.m.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.