Method of an apparatus for real-time nanometer-scale position measurement of the sensor of a scanning tunneling microscope or other sensor scanning atomic or other undulating surfaces
US5589686A · kind A · utility
Inventor
Key dates
| Filing date | Jan 19, 1996 |
| Grant date | Dec 31, 1996 |
| Priority date | — |
| Expiry date | Jan 19, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/851
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of and apparatus for producing real-time continual nanometer scale positioning data of the location of sensing probe used with one of a scanning tunneling microscope, an atomic force microscope, or a capacitive or magnetic field-sensing system, for measuring the probe distance and the position relative to an atomic surface or other periodically undulating surface such as a grating or the like moving relatively with respect to the probe, and between which and the surface there exists a sensing field, through rapid oscillating of the probe under the control of sinusoidal voltages, and comparison of the phase and amplitude of the output sinusoidal voltages produced by current in the sensing field to provide positional signals indicative of the direction and distance off the apex of the nearest atom or undulation of the surface; and, where desired, feeding back such positional signals to control the relative movement of the probe and surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.