Apparatus for manufacturing electron source and image forming apparatus
US5591061A · kind A · utility
67Cited by
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45Claims
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Key dates
| Filing date | Jul 7, 1995 |
| Grant date | Jan 7, 1997 |
| Priority date | — |
| Expiry date | Jul 7, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J1/316
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron-emitting device has a pair of device electrodes and an electroconductive thin film including an electron emitting region arranged between the electrodes. The device is manufactured via an activation process for increasing the emission current of the device. The activation process includes steps of a) applying a voltage (Vact) to the electroconductive thin film having a gap section under initial conditions, b) detecting the electric performance of the electroconductive thin film and c) modifying, if necessary, the initial conditions as a function of the detected electric performance of the electroconductive thin film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.