Moisture barrier composite film of silicon nitride and fluorocarbon polymer and its use with an on-cell tester for an electrochemical cell
US5593794A · kind A · utility
16Cited by
7References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 23, 1995 |
| Grant date | Jan 14, 1997 |
| Priority date | — |
| Expiry date | Jan 23, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31667
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A light transparent moisture barrier useful for preventing moisture from destroying the effectiveness of a moisture sensitive cell condition tester on an electrochemical cell, comprises a plurality of very thin layers of amorphous silicon nitride and a hydrophobic fluorocarbon polymer on a flexible, polymeric substrate. The layers are formed on the substrate by a deposition process such as sputtering. The thickness of any individual layer is less than one micron.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.