Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus
US5593800A · kind A · utility
31Cited by
20References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 3, 1995 |
| Grant date | Jan 14, 1997 |
| Priority date | — |
| Expiry date | Jan 3, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70358
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask manufacturing method includes holding through a first stage a master reticle having a pattern, holding through a second stage a mask substrate, projecting an exposure beam to the pattern of the master reticle held by the first stage, and projecting the pattern onto the mask substrate held by the second stage at a predetermined reduction magnification, and scanning the first and second stages in a timed relation and at a predetermined speed ratio, whereby the pattern of the master reticle is transferred to the mask substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.