Computer-aided engineering system for design of sequence arrays and lithographic masks
US5593839A · kind A · utility
329Cited by
3References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 2, 1995 |
| Grant date | Jan 14, 1997 |
| Priority date | — |
| Expiry date | Jun 2, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC40B60/14
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.