Apparatus for the controlled delivery of vaporized chemical precursor to an LPCVD reactor
US5595603A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 1, 1995 |
| Grant date | Jan 21, 1997 |
| Priority date | — |
| Expiry date | Sep 1, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4402
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus and method for the controlled delivery of vaporized chemical precursor to an LPCVD reactor is disclosed. A liquid flow controller is closely coupled with a highly efficient liquid vaporizer. The liquid flow controller, which contains no moving parts or polymeric seals, employs as a basic element an efficient gas-liquid separator downstream of the flow control element which assures that an uninterrupted constant velocity flow of liquid enters the high-temperature zone of the vaporizer. When the output of the vaporized-precursor delivery system is linked with the gas inlet of an LPCVD reactor, the very precise vapor delivery rates obtained translate into very precisely controlled thin film deposition rates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.