Plasma addressed liquid crystal display with etched electrodes
US5596431A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 1995 |
| Grant date | Jan 21, 1997 |
| Priority date | — |
| Expiry date | Mar 29, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/107
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for making an electrical device such as a PALC display device, and the electrical device or PALC device so made, in which a channel plate is provided with substantially vertical side walls, and the electrodes are formed by a self-aligning anisotropic plasma etching process which requires no photolithography. A similar process may be used to form a fanout region for individual contacting of channel electrodes. For improved contacting, preferably the fanout region is also channelled and an upstanding structure such as columns provided in the fanout channels so that the spaces between the columns and between the columns and the side walls are filled up with deposited metal that remains following the anisotropic etching process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.