Method of using precision burners for oxidizing halide-free, silicon-containing compounds
US5599371A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 30, 1994 |
| Grant date | Feb 4, 1997 |
| Priority date | — |
| Expiry date | Dec 30, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P40/57
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
A precision burner for oxidizing halide-free, silicon-containing compounds, such as, octamethyl-cyclotetrasiloxane (OMCTS), is provided. The burner includes a subassembly (13) which can be precisely mounted on a burner mounting block (107) through the use of an alignment stub (158), a raised face (162) on the burner mounting block (107), and a recess (160) in the back of the subassembly (13). The burner's face includes four concentric gas-emitting regions: a first central region (36, 90) from which exits a mixture of OMCTS and O.sub.2, a second innershield region (38, 92) from which exits N.sub.2, a third outershield region (40, 42, 94, 96) from which exits O.sub.2, and a fourth premix region (44, 98) from which exits a mixture of CH.sub.4 and O.sub.2. The burner provides more efficient utilization of halide-free, silicon-containing raw materials than prior burners.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.