Process for producing porous silicon oxide material
US5599759A · kind A · utility
18Cited by
4References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 21, 1995 |
| Grant date | Feb 4, 1997 |
| Priority date | — |
| Expiry date | Jun 21, 2015 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J21/16
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process for producing a heat-resistant and high-purity porous silicon oxide material having excellent crystallinity and uniformity in pore size. The process includes: a first step of dispersing a substance containing silicon in an aqueous solution of a surfactant and adjusting the pH of the dispersion to a value of 10 or higher; a second step of adjusting the pH thereof to a value lower than 10 and forming a composite of a silicon oxide and a surfactant; and a third step of removing the surfactant from the composite. A water-soluble component is preferably removed from the dispersion between the first and second steps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.