Flow-through ion beam source
US5601654A · kind A · utility
11Cited by
17References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 31, 1996 |
| Grant date | Feb 11, 1997 |
| Priority date | — |
| Expiry date | May 31, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/961
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and an apparatus for forming a charge neutral ion beam which is useful in producing thin films of material on electrically conductive or non-conductive substrates are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.