Return pump system for use with clean-in-place system for use with vessels
US5603826A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Feb 15, 1996 |
| Grant date | Feb 18, 1997 |
| Priority date | — |
| Expiry date | Feb 15, 2016 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B9/093
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A self-cleaning return pump system for use with a clean-in-place system for cleaning vessels includes a recirculation loop for providing flow communication including a return pump, an eductor, and a separator. The return pump is arranged to discharge a liquid through the eductor into the separator and is supplied with a substantially continuous flow of liquid from the separator. A return line provides flow communication between the vessel to be cleaned and a suction port of the eductor. The separator has a top discharge port and a bottom discharge port. The top discharge port is configured to discharge a liquid or a liquid-air mixture therefrom to the clean-in-place system. The return pump causes liquid flowing through the recirculation loop at the eductor to have sufficient dynamic head to draw liquid or a mixture of liquid and air from the vessel through the return line, into the eductor. The liquid or liquid air mixture is discharged into the separator. The bottom discharge port of the separator provides the substantially continuous flow of liquid to the return pump and substantially all of the air and a portion of the liquid is discharged from the separator top discharge port a…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.