Process for thin film formation
US5604153A · kind A · utility
71Cited by
7References
8Claims
0Family size
Inventors
Key dates
| Filing date | Jun 7, 1995 |
| Grant date | Feb 18, 1997 |
| Priority date | — |
| Expiry date | Jun 7, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/28562
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for thin film formation comprises selectively irradiating with an energy ray a substrate to the surface of which a surface treatment for providing hydrogen atoms is applied to thereby form an irradiated region and a non-irradiated region on the surface of the substrate, and forming a thin film selectively on the non-irradiated region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.