Exposing apparatus and exposing method of works
US5606172A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 27, 1995 |
| Grant date | Feb 25, 1997 |
| Priority date | — |
| Expiry date | Jan 27, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0082
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposing apparatus provided with a first alignment stage B, a first exposing stage C, a reverse stage D, a second alignmen stage E and a second exposing stage F in which the first alignment stage B, the reverse stage D and the second alignment stage E being provided in a straight line and each of the first alignment stage B and the second alignment stage E being provided in perpendicular dirction to the straight line the first exposing stage C and the second exposing stage F, respectively, and the ultraviolet rays irradiation stage H being located between the first exposing stage C and the second exposing stage F, offers an improved exposing apparatus of smaller installation space, the upper printing frame being replaced very easily when deteriorated after long time use, the lower printing frame properly absorb and displace the work from the lower printing frame, smaller consumption of the electricity, and forming of the vacuum frame and locating of the work are performed efficiently and accurately.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.