Illumination system including an asymmetrical projection reflector
US5607229A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 3, 1995 |
| Grant date | Mar 4, 1997 |
| Priority date | — |
| Expiry date | Apr 3, 2015 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF21S41/336
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An illumination system for providing higher efficiency and greater control over uniformity of illumination of non-circular apertures, which are commonly rectangular. The illumination system comprises a reflector of substantially ellipsoidal form surrounding a light source, and which has a concave reflection surface formed of a plurality of curved reflective segments extending along the length of the reflection surface, each of which is tilted and rotated by a predetermined amount to direct light from the reflector almost entirely into the area encompassed by the rectangular aperture including portions of the area which lie outside of a circular area inscribed within the aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.