Patent · US Expired

Filter having chemical resistance, antistatic property and water vapor resistance, and process for producing the same

US5607490A · kind A · utility

27Cited by
8References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 29, 1995
Grant dateMar 4, 1997
Priority date
Expiry dateMar 29, 2015

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T442/2213
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A water vapor resistant filter comprising a permeable molded material, nonwoven fabric or felt comprising polyimide fiber having a repeating unit represented by formula (I) is described. The permeable molded material, nonwoven fabric or felt is covered with a condensed polycyclic polynucleus aromatic resin, a melting fluorine resin, a solvent-soluble cold setting fluorine resin or a fluorine elastomer: ##STR1## X, R and n are defined in the specification. A water vapor resistant antistatic filter is also described, which comprises a permeable molded material, nonwoven fabric or felt comprising polyimide fiber having a repeating unit represented by the above-described formula (I). The permeable molded material, nonwoven fabric or felt is covered with an electroconductive material and a condensed polycyclic polynucleus aromatic resin, a solvent-soluble cold setting fluorine resin or a fluorine elastomer. Processes for producing these filters are also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.