Immersion type projection exposure apparatus
US5610683A · kind A · utility
1,116Cited by
8References
29Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 5, 1995 |
| Grant date | Mar 11, 1997 |
| Priority date | — |
| Expiry date | Jun 5, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70891
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus includes an illuminating device for illuminating a pattern of an original, a holder for holding a substrate, and a projection system for projecting an image of the pattern of the original onto the substrate. The projection system includes a projection optical system and a plane optical element spaced from the projection optical system and disposed opposite to the surface of the substrate. Also provided is a casing having a filled interspace formed between the optical element and the substrate, with the optical element providing an upper cover of the casing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.