Patent · US Expired

Method for forming a ferroelectric liquid crystal spatial light modulator utilizing a planarization process

US5611941A · kind A · utility

7Cited by
21References
7Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJul 17, 1995
Grant dateMar 18, 1997
Priority date
Expiry dateJul 17, 2015

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F1/141
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for forming a spatial light modulator (SLM) comprises forming a substrate (10) underneath a layer of Ferro-Electric crystal material (14) with a plurality of mirrored elements (12) disposed on the surface thereof. The process involves forming a layer of low stress oxide on the surface of the substrate over control pads or conductive strips (24) which are connected to underlying control elements. Openings (30) are formed in the oxide, followed by a formation of a conformal layer of aluminum (32). This is etched to form plugs (36) and then the substrate is subjected to a chemical/mechanical planarization step. This involves polishing the substrate to provide an optically flat surface. Thereafter, a layer of aluminum is then disposed on the surface of the substrate, patterned and etched to form the mirrored elements (12).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.