Process for deposition of diamondlike, electrically conductive and electron-emissive carbon-based films
US5616179A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 21, 1993 |
| Grant date | Apr 1, 1997 |
| Priority date | — |
| Expiry date | Dec 21, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for depositing amorphous or nanophase diamondlike carbon (DLC) and a-C:H carbon/hydrogen films with variable and controllable properties on the surface of a substrate is disclosed. The process utilizes a combined hydrocarbon ion beam and plasma-activated hydrocarbon gaseous radical flux produced by an end-Hall ion source to yield a film with good electron-emissivity characteristics or high hardness and good optical transparency, as desired. A second ion source providing a beam of argon ions above or together in nitrogen is optionally directed at the substrate for cleaning prior to deposition and for ion-assisted deposition during deposition or for doping.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.