Patent · US Expired

Method of imaging using a polymeric photoresist having pendant vinylbenzyl thymine groups

US5616451A · kind A · utility

2Cited by
4References
9Claims
0Family size

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Inventors

Key dates

Filing dateMay 24, 1995
Grant dateApr 1, 1997
Priority date
Expiry dateMay 24, 2015

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0388
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Multi-functional vinylbenzyl and vinylphenyl pendant thymine (and uracil) groups are disclosed. The monomers can be used for the production of polymers useful in photoresist and other compositions as a function of the crosslinking reactivity of the pendant groups. Images in polymer are provided by exposure to actinic radiation (e.g., UV), containing such polymer and by solvent removal of non-exposed regions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.