Compounds useful as chemical precursors in chemical vapor deposition of silicon-based ceramic materials
US5616754A · kind A · utility
23Cited by
14References
14Claims
0Family size
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Key dates
| Filing date | Jan 26, 1995 |
| Grant date | Apr 1, 1997 |
| Priority date | — |
| Expiry date | Jan 26, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/36
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In order to reduce the rate of coke formation during the industrial pyrolysis of hydrocarbons, the interior surface of a reactor is coated with a thin layer of a ceramic material, the layer being deposited by thermal decomposition of a non-oxygen containing silicon-nitrogen precursor in the vapor phase, tin an inert or reducing gas atmosphere in order to minimize the formation of oxide ceramics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.