Method of plasma-activated reactive deposition of electrically conducting multicomponent material from a gas phase
US5618395A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 2, 1996 |
| Grant date | Apr 8, 1997 |
| Priority date | — |
| Expiry date | May 2, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C28/42
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Uniform electrically conducting multicomponent material is deposited on an electrically conducting substrate by means of a PCVD method. A plasm, for example a glow discharge plasm, a high frequency plasm or a microwave plasm is generated in a reaction space. The plasma is periodically reciprocated. Starting materials for the single components of the multicomponent material are added to a flowing gas phase. To obtain multicomponent material of the desired composition, the flowing gas phase is split into at least two flowing gas phases each comprising only starting materials for a single component of the multicomponent material. The separate gas phases are time sequentially applied to the plasma. The deposited multicomponent material my be subjected to a thermal treatment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.