Method for coating a substrate with diamond film
US5620745A · kind A · utility
34Cited by
21References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 19, 1995 |
| Grant date | Apr 15, 1997 |
| Priority date | — |
| Expiry date | Dec 19, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4582
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for depositing synthetic diamond film on a substrate, including the following steps: pre-stressing the substrate to obtain a pre-deposition stress across a surface thereof; depositing the diamond film on the pre-stressed substrate surface; and cooling the film and substrate, and relieving the pre-deposition stress during the cooling. When the substrate has a higher coefficient of thermal expansion than the diamond film, the pre-stress is a compressional stress. When the substrate has a lower coefficient of thermal expansion than diamond film, the pre-stress is a tensile stress.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.