Method of manufacturing active matrix LCD using five masks
US5621556A · kind A · utility
77Cited by
9References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 30, 1995 |
| Grant date | Apr 15, 1997 |
| Priority date | — |
| Expiry date | May 30, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides a method for manufacturing an active matrix liquid crystal displaying device having a plurality of thin film transistors using five masks. A plurality of gate electrodes are formed using a first mask. A plurality of etch stoppers are formed over the gate electrodes using a second mask. A plurality of chain electrodes and a plurality of source electrodes are formed using a third mask. A passivation layer including via holes is formed using a fourth mask. A plurality of pixel electrodes are formed using a fifth mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.