Method of manufacturing electron-emitting device, electron source and image-forming apparatus
US5622634A · kind A · utility
91Cited by
2References
54Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 19, 1994 |
| Grant date | Apr 22, 1997 |
| Priority date | — |
| Expiry date | Dec 19, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron-emitting device comprising a pair of device electrodes and an electroconductive film including an electron-emitting region is manufactured by a method comprising a process of forming an electroconductive film including steps of forming a pattern on a thin film containing a metal element on the basis of a difference of chemical state, and removing part of the thin film on the basis of the difference of chemical state.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.