International dielectric mirror and production process for such a mirror
US5623375A · kind A · utility
12Cited by
11References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 8, 1994 |
| Grant date | Apr 22, 1997 |
| Priority date | — |
| Expiry date | Aug 8, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2495
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to an interferential or interference dielectric mirror and to its production process. The mirror includes a ground, planar substrate, whose surface has been replicated with a thermal plastic resin, the substrate being covered with at least one layer of colloids having a low refractive index and at least one layer of colloids having a high refractive index, the two layer types being arranged in an alternating manner. The mirror is both inexpensive and resistant to laser flux.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.