Patent · US Expired

Photopolymerizable resin material composition comprising fluorinated (meth)acrylates

US5624974A · kind A · utility

8Cited by
9References
4Claims
0Family size

Assignees

Inventors

Key dates

Filing dateDec 27, 1995
Grant dateApr 29, 1997
Priority date
Expiry dateDec 27, 2015

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09K2323/025
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A photopolymerizable resin material composition for forming a polymer used for a liquid crystal display apparatus includes at least one acrylate compound selected from the group consisting of a bifunctional acrylate compound having a fluorine substitution ratio .alpha. in the range of 0.1<.alpha.<0.8, a bifunctional acrylate compound having a fluorine substitution ratio .alpha. in the range of 0.ltoreq..alpha.<0.8, a bifunctional acrylate compound having a fluorine substitution ratio .alpha. in the range of 0.1<.alpha.<0.8, a bifunctional acrylate compound having a fluorine substitution ratio .alpha. in the range of 0.1<.alpha.<0.8 and a bifunctional acrylate compound having a fluorine substitution ratio .alpha. in the range of 0.1<.alpha.<0.8 and a bifunctional acrylate compound having a fluorine substitution ratio .alpha. in the range of 0.1<.alpha.<0.8, and a photopolymerization delaying resin material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.