Reliability of metal leads in high speed LSI semiconductors using dummy vias
US5625232A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 15, 1994 |
| Grant date | Apr 29, 1997 |
| Priority date | — |
| Expiry date | Jul 15, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor device (and method of manufacturing thereof) having metal leads (114+130) with improved reliability, comprising metal leads (114+130) on a substrate 112, a low-dielectric constant material (116) at least between the metal leads (114+130), and dummy vias (122+134) in contact with the metal leads (114+130). Heat from the metal leads (114+130) is transferable to the dummy vias (122+134), and the dummy vias (122+134) are capable of conducting away the heat. The low-dielectric constant material (116) may have a dielectric constant of less than about 3.5. An advantage of the invention is to improve reliability of metal leads in circuits using low-dielectric constant materials, especially in scaled-down circuits that are compact in the horizontal direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.