Rotating analyzer ellipsometer and ellipsometry technique
US5625455A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 6, 1995 |
| Grant date | Apr 29, 1997 |
| Priority date | — |
| Expiry date | Jun 6, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/211
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A novel ellipsometer and ellipsometry technique are disclosed that allow the determination of optical and spectroscopic properties of a sample material. In particular, the complex dielectric constant (.epsilon.) and the complex index of refraction (N) of a sample material are determined from simple reflectance intensity measurements at a single frequency. The disclosed invention may be used to determine desired optical and spectroscopic properties of a variety of sample materials, including solid and fluid materials. The disclosed method and apparatus for determining these properties are not dependent upon numerical approximations or frequency scans. The disclosed invention has a broadband working frequency range and may take advantage of radiation sources providing elliptically-polarized incident radiation, such as new solid-state lasers. The disclosed invention thereby provides a significant advance over prior ellipsometer devices and ellipsometry techniques.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.