Hard-carbon-film-coated substrate and apparatus for forming the same
US5626963A · kind A · utility
17Cited by
5References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 14, 1994 |
| Grant date | May 6, 1997 |
| Priority date | — |
| Expiry date | Jun 14, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A hard-carbon-film-coated substrate includes in stacked sequence a substrate, an intermediate layer, and a hard carbon film. The substrate consists of a metal or an alloy mainly composed of Ni or Al, or stainless steel. The intermediate layer is mainly composed of Ru, Si, Ge or carbon, or is a mixed layer including Ru, Si, or Ge mixed with at least one of carbon, nitrogen or oxygen, with a composition gradient across its thickness. An apparatus for forming the coated substrate especially includes means for forming the intermediate layer and means for forming the hard carbon film in the same vacuum chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.