Photoimageable resist compositions containing photobase generator
US5627010A · kind A · utility
39Cited by
10References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 15, 1994 |
| Grant date | May 6, 1997 |
| Priority date | — |
| Expiry date | Apr 15, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.