Gas sampling system and method
US5627328A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 1995 |
| Grant date | May 6, 1997 |
| Priority date | — |
| Expiry date | Dec 29, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N1/24
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A gas sampling system and method that utilizes a double aspirator design to precisely control the flow rate of a gas sample past a sensor (44, 46, or 48). The double aspirator design includes a primary aspirator (24) to draw a gas sample from the exhaust stack (14) at a first flow rate and a secondary aspirator (26) to draw a portion of the gas sample from the primary aspirator at a second flow rate past the sensors. In addition, a first pressure sensor (74) and second pressure sensor (76) are provided in order to monitor changes in the pressure differential across the sensor so that corresponding changes in the second flow rate can be accounted for by the control unit (18) when processing the measurement data from the sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.