Isotopic analysis process by optical emission spectrometry on laser-produced plasma
US5627641A · kind A · utility
4Cited by
2References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 14, 1995 |
| Grant date | May 6, 1997 |
| Priority date | — |
| Expiry date | Jun 14, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/718
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Isotopic analysis process by optical emission spectrometry on laser-produced plasma. According to the invention, the sample to be analyzed (10) is irradiated by a laser beam (20) to produce a plasma (13), the light spectrum emitted by said plasma is analyzed and from it is deduced the isotopic composition of the sample. Application to isotopic analysis in the nuclear industry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.