Method for fabricating a field emission display
US5628661A · kind A · utility
21Cited by
5References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 7, 1995 |
| Grant date | May 13, 1997 |
| Priority date | — |
| Expiry date | Jun 7, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/025
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method is provided for fabricating a field emission device which can be adopted as the source for a flat panel display, an ultra-high frequency amplifier sensor, or an electron-beam-applied instrument. A polyimide layer is used as a release layer and a metal mask is formed thereon, thereby enabling the height of micro-tips to be easily controlled. Since the polyimide layer is soluble in an appropriate solvent, contamination does not occur during an etching process, thereby increasing the reliability of the device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.