System for ablative imaging by proximity lithography
US5633123A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 20, 1995 |
| Grant date | May 27, 1997 |
| Priority date | — |
| Expiry date | Dec 20, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/165
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A system for prolonging the useful life of a mask while ablating a pattern into a workpiece. The system includes a workpiece, a debris-blocking layer thereon, a laser directed toward the workpiece, and a mask provided between the laser and debris-blocking layer. The workpiece may be a data storage disk comprising a substrate and a magnetic coating thereon. The laser may be an ultraviolet laser and the debris-blocking layer should be transparent to the light emitted by the laser. The pattern may include concentric or spiral optical servo tracks in the magnetic coating. The debris-blocking layer minimizes degradation of the mask, thereby minimizing the need to clean the mask and prolonging the useful life of the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.