Tristertbutoxyphenyl sulfonium tosylate compound
US5633409A · kind A · utility
5Cited by
7References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 27, 1995 |
| Grant date | May 27, 1997 |
| Priority date | — |
| Expiry date | Jan 27, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C381/12
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Trifluoromethanesulfonic and p-toluenesulfonic acid bis- or tris(p-tert-butoxyphenyl)sulfonium salts are novel. They are prepared from bis(p-tert-butoxyphenyl)sulfoxide which is also novel. A chemically amplified positive resist composition which contains the sulfonium salt as a photo-acid generator is highly sensitive to deep-UV rays, electron beams and X-rays, can be developed with alkaline aqueous solution to form a pattern, and is thus suitable for use in a fine patterning technique.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.