Exposure apparatus
US5633698A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 27, 1995 |
| Grant date | May 27, 1997 |
| Priority date | — |
| Expiry date | Oct 27, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7096
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus comprises a substrate holding portion for holding a photosensitive substrate including a surface, a substrate stage for two-dimensional positioning of the photosensitive substrate via the substrate holding portion, the substrate stage including an upper surface, and an exposure system for transferring a pattern on a mask to the photosensitive substrate by an exposing illumination light. The substrate holding portion is provided in the substrate stage so that the portion of the upper surface of the substrate stage surrounding the photosensitive substrate is substantially flush with the surface of the photosensitive substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.