Method for producing thin film and apparatus therefor
US5635241A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 29, 1995 |
| Grant date | Jun 3, 1997 |
| Priority date | — |
| Expiry date | Mar 29, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/22
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and an apparatus for producing a thin film. The method includes the steps of placing a substrate having a surface for receiving the thin film on a substrate holder disposed within a thin film production chamber, the production chamber being connected by an arm to a rotatable member; charging into the thin film production chamber a material to be deposited on the surface of the substrate; rotating the rotatable member to generate a centrifugal force thereby creating a gravity field throughout the production chamber having a direction toward the surface of the substrate; heating the substrate; and evaporating the material to be deposited by heating thereby accelerating the material to be deposited toward the surface of the substrate in a direction of the gravity field, whereby the material to be deposited is deposited on the surface of the substrate. Alternatively, the steps of charging and evaporating can be replaced with the step of supplying a raw gas of a material to be deposited as the thin film on the surface of the substrate via piping disposed within the rotatable member and the arm thereby accelerating the gas toward the surface of the substrate in a direction of th…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.