Process for the production of a microtip electron source and microtip electron source obtained by this process
US5635790A · kind A · utility
3Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 14, 1995 |
| Grant date | Jun 3, 1997 |
| Priority date | — |
| Expiry date | Apr 14, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J1/3042
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A process for the production of microtip electron sources and the products produced thereby. The process includes a first cleaning stage with a first wet chemical cleaning substage and/or a second plasma cleaning substage and a finishing stage using surface etching. A second cleaning stage using a wet chemical cleaning can also be used. The process uses a system of cathode conductors, grids superimposed an intermediate insulator and microtips deposited on the cathode conductors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.