Device and method for forming a plasma by application of microwaves
US5637150A · kind A · utility
6Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 23, 1996 |
| Grant date | Jun 10, 1997 |
| Priority date | — |
| Expiry date | May 23, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A device for forming a microwave plasma including an ionizing chamber wherein a gas can be introduced so as to undergo excitation induced by the presence of a high frequency alternating electric field produced by a plurality of metal antennas. The device includes a gas-free volume wherein metal antennas are arranged parallel to one another and are distributed at the nodes of a regular plane array, an end of each antenna extending from the gas-free volume in the ionizing chamber and an induction loop producing microwaves in the gas-free volume.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.