Process for producing patterned resin films which includes pretreatment with water soluble salt aqueous solution prior to film development
US5637443A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 5, 1994 |
| Grant date | Jun 10, 1997 |
| Priority date | — |
| Expiry date | Jul 5, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An uncomplicated and easy to control process for forming patterns, wherein an active beam sensitive resin is exposed to an active beam such that a correctly formed pattern is produced on the resin. The process comprises the steps of forming a film of an active beam sensitive resin on a substrate, exposing the film to an active beam, and developing the exposed film with a developing solution comprising a weakly basic salt in a basic aqueous solution having a hydrogen ion concentration sufficient to finish the developing within a desired period of time and an ionic strength sufficient to prevent a substantial decrease in the thickness of the exposed film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.