Patent · US Expired

Method and apparatus for processing a specimen

US5637538A · kind A · utility

2Cited by
3References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 21, 1994
Grant dateJun 10, 1997
Priority date
Expiry dateNov 21, 2014

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/31744
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The invention relates to a method and to apparatus for processing a specimen, particularly an integrated circuit, in which an area of the specimen to be processed is scanned with a corpuscular beam and at least one gas is supplied above the area to be processed so that with the aid of the corpuscular beam a chemical reaction takes place on the area to be processed. The processing speed can be markedly increased by the use of a magnetic field in the region of the probe.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.