Patent · US Expired

Methods for optimizing of an optical assay device

US5639671A · kind A · utility

110Cited by
47References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 28, 1995
Grant dateJun 17, 1997
Priority date—
Expiry dateMar 28, 2015

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S435/808
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Method for optimizing an optical assay device for an analyte, including the steps of: providing a substrate having a chosen thickness of an optically active layer thereon; providing an attachment layer of a chosen thickness on the optical coating; providing a receptive layer of a chosen thickness for the analyte, wherein at least one of the thicknesses of the optically active layer, attachment layer and receptive layer is varied to provide a plurality of thicknesses of that layer; contacting analyte with the receptive layer under conditions in which an increase in mass on the receptive layer results; and determining the optical thickness of the layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.