Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers
US5641604A · kind A · utility
7Cited by
3References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 4, 1996 |
| Grant date | Jun 24, 1997 |
| Priority date | — |
| Expiry date | Jan 4, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.