Plasma CVD method of producing a gradient layer

US5643638A · kind A · utility

Assignee

• Schott Glaswerke · DE

Inventors

• Jurgen Otto · Hattingen, DE
• Johannes Segner · Stromberg, DE
• Volker Paquet · Mainz, DE

Key dates

• Filing date: Dec 13, 1995
• Grant date: Jul 1, 1997
• Expiry date: Dec 13, 2015

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B1/14
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to a plasma CVD method for producing a gradient layer wherein the layer gradient is produced in the direction of layer growth by changing at least one plasma power parameter during the coating process. According to the invention, thin gradient layers are generated with high precision by supplying the plasma power in a pulsed manner and adjusting the layer gradient by changing the plasma power parameters of pulse amplitude, pulse duration and/or pulse interval.