Decomposition of organohalogen compounds in dust-laden-waste gases

US5645806A · kind A · utility

Assignee

• BASF SE

Inventors

• Klaus Hess
• Roland Spahl · Lorsch, DE
• Hans Christoph Horn · Lambsheim, DE
• Ingo H. Dorn · Schifferstadt, DE
• Gunter Dinkhauser · Schifferstadt, DE
• Hans-Ingo Joschek

Key dates

• Filing date: Jul 14, 1994
• Grant date: Jul 8, 1997
• Expiry date: Jul 14, 2014

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B01D53/8662
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

A process for decomposing organohalogen compounds which are present in dust-laden gases which have a carbon content of less than 0.6% by weight, by oxidative breakdown with the aid of solid catalysts suitable for this purpose, wherein PA1 a) the dust is deposited from the gases at 250.degree.-500.degree. C., and the dust-free gas is passed together with oxygen or an oxygen-containing gas over the catalyst, or PA1 b) the deposition of the dust takes place at below 250.degree. C., the organohalogen compounds are desorbed from the dust in an oxygen-containing gas stream at 250.degree.-500.degree. C., and the gas stream is passed over the catalyst, or PA1 c) the dust-laden gas is passed in the presence of oxygen over the catalyst at 250.degree.-500.degree. C., and the dust is subsequently removed.