Patent · US Expired

Method of bonding wafers having vias including conductive material

US5646067A · kind A · utility

312Cited by
46References
17Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJun 5, 1995
Grant dateJul 8, 1997
Priority date
Expiry dateJun 5, 2015

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S148/135
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A surface mountable integrated circuit and a method of manufacture are disclosed. A wafer 110 has a die with an integrated circuit 119 in one surface of the wafer. A via 130 extends to the opposite surface. The via has a sidewall oxide 131 and is filled with a conductive material such as metal or doped polysilicon. The metal may comprise a barrier layer and an adhesion layer. The second end of the via can be fashioned as a prong 233 or a receptacle 430. Dies with vias can be stacked on top of each other or surface mounted to printed circuit boards or other substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.