Dry resist
US5648159A · kind A · utility
40Cited by
18References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 12, 1995 |
| Grant date | Jul 15, 1997 |
| Priority date | — |
| Expiry date | Jun 12, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31786
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The disclosure describes a dry resist comprising: a biaxially oriented laminated polyester film whose surface layer on at least one side contains particles having an average particle diameter of 0.01 to 3.0 .mu.m, and has a center line average roughness of not less than 0.005 .mu.m and a maximum height of less than 1.5 .mu.m, and which has a haze of not more than 1.5%; a photoresist layer formed on said biaxially oriented laminated polyester film; and a protective film formed on said photoresist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.