Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether
US5648194A · kind A · utility
6Cited by
3References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 3, 1995 |
| Grant date | Jul 15, 1997 |
| Priority date | — |
| Expiry date | Aug 3, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0226
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition comprising an alkali soluble resin, an o-naphthoquinone diazide sulfonic acid ester photoactive compound, and a vinyl ether compound. The o-naphthoquinone diazide sulfonic acid ester is replaced in part with the vinyl ether composition to decrease the concentration of the photoactive compound while increasing the photospeed of the composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.