Long-wavelength PTSI infrared detectors and method of fabrication thereof
US5648297A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 21, 1996 |
| Grant date | Jul 15, 1997 |
| Priority date | — |
| Expiry date | May 21, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/759
Abstract
Extended cutoff wavelengths of PtSi Schottky infrared detectors in the long wavelength infrared (LWIR) regime have been demonstrated for the first time. This result was achieved by incorporating a 1-nm-thick p+ doping spike at the PtSi/Si interface. The extended cutoff wavelengths resulted from the combined effects of an increased electric field near the silicide/Si interface due to the p+ doping spike and the Schottky image force. The p+ doping spikes were grown by molecular beam epitaxy at 450 degrees Celsius using elemental boron as the dopant source, with doping concentrations ranging from 1.times.10.sup.19 to 1.times.10.sup.21 cm.sup.-3. The cutoff wavelengths were shown to increase with increasing doping concentrations of the p+ spikes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.